Polish (CMP)

The only known method to finely polish wafers for chip production is the CMP process (Chemical Mechanical Polishing). In this process, polishing agent suspensions are used to machine the material. These suspensions have a chemical effect on the layer being polished as well as a mechanical, abrasive effect on the surface of the wafer.

The grain size distribution of these suspensions must be precisely defined in order to obtain the appropriate fluidity in the process. Of primary importance is to eliminate oversized particles of any kind in order to prevent flaws caused by scratches. CMP slurries based on alumina or silica (SiO2) are manufactured on an industrial scale in Zeta® mills.


Wet Grinding

Products & Solutions in the field of Wet Grinding
Nano mill Zeta® RS

Specially designed for grinding and dispersing to the nanometer range. This new development combines easy handling and revolutionary machine technology with ergonomic design.

The next Generation of Agitator Bead Mills

NETZSCH-Feinmahltechnik GmbH has now developed the new Alpha® modular machine platform. Compared to earlier-generation machines, this series is designed such that different grinding systems can be mounted on the same base platform as appropriate for a defined drive capacity.

Circulation mill system Type Zeta®

The circulation grinding system for all fields of application. Suitability for all viscosities and nearly all products is achieved with different grinding media from 90 µm to 3 mm. This provides highest product qualities and fineness down to the nanometer range.

Laboratory agitator bead mill LabStar

The multi-functional laboratory mill LabStar enables scientific academic work even at difficult research and development tasks and convinces by easy handling. The laboratory mill LabStar is the smallest grinding unit of NETZSCH-Feinmahltechnik GmbH that enables an exact scale-up to comparable production machines.

Laboratory agitator bead mill MiniZeta

The universally applicable laboratory circulation mill MiniZeta is essential for research and development. Its easy operation, equipped with easy to clean tools of stainless steel, achieves the machine excellent results down to the Sub-Micron range.

MiniSeries / MicroSeries - Laboratory Mills for Product Development of Smallest Batches

The compact, universally applicable laboratory circulation mills of the MiniSeries impress with their easy handling when processing very small quantities from 0.25 to 0.5 l up to particle sizes in the nanometer range. It is possible to conduct many tests with low loss of product and significant results within a short period of time.

Finest wet grinding technology – the laboratory mills of the MicroSeries are an investment in the future for new product developments of different fields of application of pigmented ink jets, technical ceramics, cosmetics, pharmaceutical applications and nano-scale high-tech products.


Dry Grinding

Products & Solutions in the field of Dry Grinding
s-Jet® Steam Jet Mill

The s-Jet® System (patent pending) is a new innovation in a line of consistent developments being made in the area of air jet milling. Final finenesses in the submicron range (example: d50 0.2 µm) can now be achieved with fluidized bed jet mills. As opposed to conventional dry grinding processes with fluidized bed jet mills, the s-Jet® System uses superheated steam as its milling gas.

s-Jet® 25 Laboratory-Scale-Steam Jet Mill

The s-Jet® System (patent pending) is a new innovation in a line of consistent developments being made in the area of air jet milling. Final finenesses in the submicron range (example: d50 0.2 µm) can now be achieved with fluidized bed jet mills. As opposed to conventional dry grinding processes with fluidized bed jet mills, the s-Jet® System uses superheated steam as its milling gas.


NETZSCH-Beads®

Products & Solutions in the field of NETZSCH-Beads®
ZetaBeads® Plus

Yttrium-stabilized zirconium oxide grinding beads (High-end quality)

ZetaBeads® Nano

Yttrium-stabilized zirconium oxide grinding beads (High-end quality) for nano applications